Silicon nanocrystal memories by LPCVD of amorphous silicon, followed by solid phase crystallization and thermal oxidation
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چکیده
منابع مشابه
Silicon nanocrystals by thermal annealing of Si-rich silicon oxide prepared by the LPCVD method
The Si-rich silicon oxide (SiOx) thin films are prepared on silicon crystalline substrates by low pressure chemical vapor deposition (LPCVD) method. The oxygen concentration x are controlled by the ratio of the partial pressures of N2O and SiH4 gases in the reaction chamber. In order to induce the phase separation on SiO2 and Si nanostructures the samples are annealed at the temperatures 900– 1...
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ژورنال
عنوان ژورنال: Journal of Physics: Conference Series
سال: 2005
ISSN: 1742-6588,1742-6596
DOI: 10.1088/1742-6596/10/1/008